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As thin film technology advances, semiconductor and hard disk manufacturers increasingly recognize the need for X-ray fluorescence (XRF) analysis. PANalytical's Semyos energy-dispersive XRF wafer analyzer can play a vital role.
The system combines PANalytical's existing know-how on thin film XRF analysis with a new, less than 23 µm FWHM (Full Width, Half Max) measuring spot enabling measurements to be made on the up to 300mm production wafers themselves.
Meeting industry demands
The Semyos microspot wafer analyzer perfectly meets the needs of the semiconductor and data storage industries, such as:
- On-product thin film metrology
- In-line process control
- Simultaneous determination of film thickness and composition
- Ability to characterize both single films and multilayer stacks
- Excellent repeatability and reproducibility
- Minimal cost of operation through excellent uptime and high throughput
Wide range of applications
The Semyos is a high-end, in-line XRF metrology tool with all the required automation features and is compliant with all relevant SEMI standards. It is suitable for a wide range of applications, such as:
- Characterization of films containing elements from Al onwards in metrology areas in the scribeline
- Accept/reject assessment of complex stacks
- Enabling control of the metallization processes
- Analysis of barrier films
- Characterization of read/write heads and magnetic media thin films
Designed for ease of use
FALMO-2G, PANalytical's own versatile equipment front end module (EFEM), enables the Semyos to load 100-300 mm wafers from a user-selected combination of SMIF, FOUP and open cassette load ports.
Our tried and tested software routines smooth the whole process, from the initial set-up, through data collection and analysis to results presentation and data communication.
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